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Hur, Min Sup
Computational Plasma Lab
Research Interests
  • Laser-Plasma Electron Accelerator and Table-top Femto Hard X-ray generation

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Electron bunching from a dc-biased, single-surface multipactor with realistically broad energy spectrum and emission angle of secondary electrons

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Title
Electron bunching from a dc-biased, single-surface multipactor with realistically broad energy spectrum and emission angle of secondary electrons
Author
Shin, DongwonJeon, Seok-GyKim, Jung-IlKim, Geun-JuHur, Min Sup
Keywords
Electron bunch; Electron bunching; Electron trajectories; Emission angle; Energy spectra; Energy spreads; Longitudinal velocity; Particle-in-cell simulations; PIC simulation; Secondary electrons; Single-surface multipactor; Theoretical result
Issue Date
201202
Publisher
AMER INST PHYSICS
Citation
PHYSICS OF PLASMAS, v.19, no.2, pp.1 - 5
Abstract
We studied the influences of wide energy spectrum and emission angle of secondary electrons on electron bunching from a dc-biased single surface multipactor. In our previous study of the same system, an ideally narrow energy spread of secondary electrons without emission angle was used in the analysis of the electron trajectory [M. S. Hur, J.-I. Kim, G.-J. Kim, and S.-G. Jeon, Phys. Plasmas 18, 033103 (2011) and S.-G. Jeon, J.-I. Kim, S.-T. Han, S.-S. Jung, and J. U. Kim, Phys. Plasmas 16, 073101 (2009)]. In this paper, we investigated the cases with realistic energy spectrum, which is featured by a wide energy spread and significant emission angle. To theoretically approach the matter of emission angle, we employed a concept of effective longitudinal velocity distribution. The theoretical results are verified by particle-in-cell (PIC) simulations. We also studied the electron bunching from a copper by PIC simulations, where we observed stable electron bunches with bunch width of approximately 80 mu m.
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DOI
http://dx.doi.org/10.1063/1.3685697
ISSN
1070-664X
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SNS_Journal Papers
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