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Author

Kwon, Min-Suk
Ubiquitous Photonics Laboratory (UP Lab)
Research Interests
  • Photonics, plasmonics, waveguides, planar lightwave circuits

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Characterizations of realized metal-insulator-silicon-insulator-metal waveguides and nanochannel fabrication via insulator removal

Cited 8 times inthomson ciCited 6 times inthomson ci
Title
Characterizations of realized metal-insulator-silicon-insulator-metal waveguides and nanochannel fabrication via insulator removal
Author
Kwon, Min-SukShin, Jin-SooShin, Sang-YungLee, Wan-Gyu
Keywords
Asymmetric couplers; Excess loss; Fabrication process; Incident light; Measurement results; Nano channels; Plasmonic; Plasmonic waveguides; Propagation characteristics; Propagation loss; Si photonics; Silicon on insulator wafers; Standard CMOS technology; Symmetric couplers; Transverse electric polarizations
Issue Date
201209
Publisher
OPTICAL SOC AMER
Citation
OPTICS EXPRESS, v.20, no.20, pp.21875 - 21887
Abstract
We investigate experimentally metal-insulator-silicon-insulator-metal (MISIM) waveguides that are fabricated by using fully standard CMOS technology. They are hybrid plasmonic waveguides, and they have a feature that their insulator is replaceable with functional material. We explain a fabrication process for them and discuss fabrication results based on 8-inch silicon-on-insulator wafers. We measured the propagation characteristics of the MISIM waveguides that were actually fabricated to be connected to Si photonic waveguides through symmetric and asymmetric couplers. When incident light from an optical source has transverse electric (TE) polarization and its wavelength is 1318 or 1554 nm, their propagation losses are between 0.2 and 0.3 dB/mu m. Excess losses due to the symmetric couplers are around 0.5 dB, which are smaller than those due to the asymmetric couplers. Additional measurement results indicate that the MISIM waveguide supports a TE-polarized hybrid plasmonic mode. Finally, we explain a process of removing the insulator without affecting the remaining MISIM structure to fabricate similar to 30-nm-wide nanochannels which may be filled with functional material.
URI
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DOI
http://dx.doi.org/10.1364/OE.20.021875
ISSN
1094-4087
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ECE_Journal Papers

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