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정창욱

Jeong, Changwook
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dc.citation.endPage 2005 -
dc.citation.number 4B -
dc.citation.startPage 2001 -
dc.citation.title JAPANESE JOURNAL OF APPLIED PHYSICS -
dc.citation.volume 46 -
dc.contributor.author Ryoo, Kyung-Chang -
dc.contributor.author Song, Yoon Jong -
dc.contributor.author Shin, Jae-Min -
dc.contributor.author Park, Sang-Su -
dc.contributor.author Lim, Dong-Won -
dc.contributor.author Kim, Jae-Hyun -
dc.contributor.author Park, Woon-Ik -
dc.contributor.author Sim, Ku-Ri -
dc.contributor.author Jeong, Ji-Hyun -
dc.contributor.author Kang, Dae-Hwan -
dc.contributor.author Kong, Jun-Hyuck -
dc.contributor.author Jeong, Changwook -
dc.contributor.author Oh, Jae-Hee -
dc.contributor.author Park, Jae-Hyun -
dc.contributor.author Kim, Jeong-In -
dc.contributor.author Oh, Yong-Tae -
dc.contributor.author Kim, Ji-Sun -
dc.contributor.author Eun, Seong-Ho -
dc.contributor.author Lee, Kwang-Woo -
dc.contributor.author Koh, Seong-Pil -
dc.contributor.author Fai, Yung -
dc.contributor.author Koh, Gwan-Hyob -
dc.contributor.author Jeong, Gi-Tae -
dc.contributor.author Jeong, Hong-Sik -
dc.contributor.author Kim, Kinam -
dc.date.accessioned 2023-12-22T09:36:02Z -
dc.date.available 2023-12-22T09:36:02Z -
dc.date.created 2019-07-11 -
dc.date.issued 2007-04 -
dc.description.abstract It is very important to maintain stable cell uniformity for reliable operation and wide sensing margin since the writing current is mainly governed by the bottom electrode contact (BEC) size which is especially sensitive to small process variation. In order to accomplish low writing current with uniform cell distribution, advanced storage module technology using ring type BEC was proposed. Using this, it was possible to achieve flat and uniform BEC, which results in a wide sensing margin and high manufacturability. Finally, we firstly fabricated advanced ring type contact structure and firstly evaluated based on high density 256 Mbytes phase change random access memory (PRAM) with small cell size technologies. -
dc.identifier.bibliographicCitation JAPANESE JOURNAL OF APPLIED PHYSICS, v.46, no.4B, pp.2001 - 2005 -
dc.identifier.doi 10.1143/JJAP.46.2001 -
dc.identifier.issn 0021-4922 -
dc.identifier.scopusid 2-s2.0-34547914911 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/27154 -
dc.identifier.url https://iopscience.iop.org/article/10.1143/JJAP.46.2001 -
dc.identifier.wosid 000247050200035 -
dc.language 영어 -
dc.publisher IOP PUBLISHING LTD -
dc.title Ring contact electrode process for high density phase change random access memory -
dc.type Article -
dc.description.isOpenAccess FALSE -
dc.relation.journalWebOfScienceCategory Physics, Applied -
dc.relation.journalResearchArea Physics -
dc.type.docType Article; Proceedings Paper -
dc.description.journalRegisteredClass scie -
dc.description.journalRegisteredClass scopus -
dc.subject.keywordAuthor PRAM -
dc.subject.keywordAuthor ring type BEC -
dc.subject.keywordAuthor core dielectrics -
dc.subject.keywordAuthor reset current -
dc.subject.keywordAuthor high density -

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