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Baik, Jeong Min
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dc.citation.endPage 4 -
dc.citation.number 20 -
dc.citation.startPage 1 -
dc.citation.title APPLIED PHYSICS LETTERS -
dc.citation.volume 103 -
dc.contributor.author Rathi, Servin -
dc.contributor.author Park, Jin-Hyung -
dc.contributor.author Lee, In-yeal -
dc.contributor.author Kim, Min Jin -
dc.contributor.author Baik, Jeong Min -
dc.contributor.author Kim, Gil-Ho -
dc.date.accessioned 2023-12-22T03:14:28Z -
dc.date.available 2023-12-22T03:14:28Z -
dc.date.created 2013-12-23 -
dc.date.issued 2013-11 -
dc.description.abstract Rapid thermal annealing of VO2 nanobeams in an ambient argon environment has been carried out at various temperatures after device fabrication. Our analysis revealed that increasing the annealing temperature from 200°C to 400°C results in the reduction of both ohmic and nanobeam resistances with an appreciable decrease in joule-heating based transition voltage and transition temperature, while samples annealed at 500°C exhibited a conducting rutile-phase like characteristics at room temperature. In addition, these variation trends were explored using a physical model and the results were found to be in agreement with the observed results, thus verifying the model. -
dc.identifier.bibliographicCitation APPLIED PHYSICS LETTERS, v.103, no.20, pp.1 - 4 -
dc.identifier.doi 10.1063/1.4831995 -
dc.identifier.issn 0003-6951 -
dc.identifier.scopusid 2-s2.0-84889678050 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/2419 -
dc.identifier.url http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=84889678050 -
dc.identifier.wosid 000327818700089 -
dc.language 영어 -
dc.publisher AMER INST PHYSICS -
dc.title Correlation between thermal annealing temperature and Joule-heating based insulator-metal transition in VO2 nanobeams -
dc.type Article -
dc.relation.journalWebOfScienceCategory Physics, Applied -
dc.relation.journalResearchArea Physics -
dc.description.journalRegisteredClass scie -
dc.description.journalRegisteredClass scopus -

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