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DC Field | Value | Language |
---|---|---|
dc.citation.endPage | 17763 | - |
dc.citation.number | 46 | - |
dc.citation.startPage | 17760 | - |
dc.citation.title | JOURNAL OF PHYSICAL CHEMISTRY C | - |
dc.citation.volume | 112 | - |
dc.contributor.author | Cho, Seungho | - |
dc.contributor.author | Kim, Semi | - |
dc.contributor.author | Kim, Nam-Hyo | - |
dc.contributor.author | Lee, Ung-Ju | - |
dc.contributor.author | Jung, Seung-Ho | - |
dc.contributor.author | Oh, Eugene | - |
dc.contributor.author | Lee, Kun-Hong | - |
dc.date.accessioned | 2023-12-22T08:15:25Z | - |
dc.date.available | 2023-12-22T08:15:25Z | - |
dc.date.created | 2017-06-09 | - |
dc.date.issued | 2008-11 | - |
dc.description.abstract | We have fabricated density-controlled ZnO nanorod arrays on a flexible substrate (Teflon) using inductively coupled plasma (ICP) etching with anodic aluminum oxide (AAO) membranes and microwave irradiation without using a catalyst at 90 degrees C. The average interpore distances of Si surface etched with an AAO membrane anodized in 0.3 M oxalic acid (Mask 1) and an AAO membrane anodized in 0.1 M phosphoric acid (Mask 2) were similar to 100 nm (Si pore density, similar to 1.86 x 10(10)/cm(2)) and similar to 450 nm (Si pore density, similar to 7.16 x 10(8)/cm(2)), respectively. During the microwave irradiation, ZnO nanorods grew from the Si pores. Thus, we could control the ZnO nanorods density by changing the interpore distance of the AAO membrane mask (Mask I case, similar to 1.34 x 10(10)/cm(2) and Mask 2 case, similar to 6.12 x 10(8)/cm(2)). | - |
dc.identifier.bibliographicCitation | JOURNAL OF PHYSICAL CHEMISTRY C, v.112, no.46, pp.17760 - 17763 | - |
dc.identifier.doi | 10.1021/jp808117q | - |
dc.identifier.issn | 1932-7447 | - |
dc.identifier.scopusid | 2-s2.0-57249093787 | - |
dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/22166 | - |
dc.identifier.url | http://pubs.acs.org/doi/abs/10.1021/jp808117q | - |
dc.identifier.wosid | 000260923900006 | - |
dc.language | 영어 | - |
dc.publisher | AMER CHEMICAL SOC | - |
dc.title | In Situ Fabrication of Density-Controlled ZnO Nanorod Arrays on a Flexible Substrate Using Inductively Coupled Plasma Etching and Microwave Irradiation | - |
dc.type | Article | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordPlus | CONTROLLED GROWTH | - |
dc.subject.keywordPlus | OXIDE NANOWIRES | - |
dc.subject.keywordPlus | LOW-TEMPERATURE | - |
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