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신흥주

Shin, Heungjoo
Micro/Nano Integrated Systems Lab.
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Patternable Nanoporous Carbon Electrodes for Use as Supercapacitors

Author(s)
Lim, YeoungjinWoo, JinwooJoo, Sang HoonShin, Heungjoo
Issued Date
2016-07
DOI
10.1149/2.0561609jes
URI
https://scholarworks.unist.ac.kr/handle/201301/20024
Fulltext
http://jes.ecsdl.org/content/163/9/A1886.abstract
Citation
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, v.163, no.9, pp.A1886 - A1892
Abstract
Capacity of electrochemical supercapacitors strongly depends on the specific surface area of electrodes that can be significantly enlarged by incorporating nanoporous morphology. We present patternable nanoporous carbon microstructures, fabricated using simple O-2 microwave plasma etching and carbon-microelectromechanical systems processes, for application as supercapacitors. By incorporating a simple O-2 microwave plasma etching process prior to the pyrolysis process, nanoporous surfaces with nanoporous sponge-like networks are formed on the pre-patterned negative photoresist structures due to a self-masking effect. These O-2-plasma-etched photoresist structures are converted into nanoporous glassy carbon electrodes (average pore size < 1 nm) via pyrolysis while retaining the morphology of sponge-like networks. The pore size and surface morphology are controllable depending on O-2 plasma etching time. As a result, the surface area and electrochemical capacitance of the nanoporous carbon surface are increased, respectively, by up to 795 times (similar to 994 m(2) g(-1)) and 28.1 times (23.9 mF cm(-2)) compared to a bare carbon surface. In addition, arrays of 3D nanoporous carbon microstructures such as cylindrical posts can be simply integrated on the planar carbon electrode surface by adding a photoresist patterning process prior to the O-2 plasma etching, enabling a further improvement in capacitance by a factor of up to 37.3.
Publisher
ELECTROCHEMICAL SOC INC
ISSN
0013-4651
Keyword
MICRO-SUPERCAPACITORSTHIN-FILMSPLASMAGRAPHENEANODESMEMSFABRICATIONNANOSHEETSPYROLYSISNANOWIRES

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