File Download

There are no files associated with this item.

  • Find it @ UNIST can give you direct access to the published full text of this article. (UNISTARs only)

Views & Downloads

Detailed Information

Cited time in webofscience Cited time in scopus
Metadata Downloads

Full metadata record

DC Field Value Language
dc.citation.endPage 15690 -
dc.citation.number 24 -
dc.citation.startPage 15684 -
dc.citation.title ACS APPLIED MATERIALS & INTERFACES -
dc.citation.volume 8 -
dc.contributor.author Jung, Yun Kyung -
dc.contributor.author Jung, Cheulhee -
dc.contributor.author Park, Hyun Gyu -
dc.date.accessioned 2023-12-21T23:39:38Z -
dc.date.available 2023-12-21T23:39:38Z -
dc.date.created 2016-07-13 -
dc.date.issued 2016-06 -
dc.description.abstract We describe a novel strategy to fabricate a well-defined polydiacetylene (PDA) supramolecular pattern on polyvinylidene fluoride (PVDF) membrane utilizing a DNA bio-photomask. By focusing on that, the absorption spectrum of DNA molecules having a λmax at 260 nm overlaps with the wavelength at which the photopolymerization of the diacetylene monomer occurs, DNA molecules are used to define specific patterns on PVDF membranes coated with diacetylene lipids by shielding the applied 254 nm UV light and consequently preventing the photopolymerization of the lipids. As a result, the DNA-covered regions retain the original white color on the membrane while the regions uncovered by DNA molecules undergo the color change to blue through the photopolymerization by 254 nm UV irradiation. On the basis of the selective illumination through a DNA photomask, we precisely manufacture specific patterns using a microarray spotting method and also demonstrate the capability of this strategy to achieve a novel colorimetric DNA sensor without any complicated process. -
dc.identifier.bibliographicCitation ACS APPLIED MATERIALS & INTERFACES, v.8, no.24, pp.15684 - 15690 -
dc.identifier.doi 10.1021/acsami.6b01830 -
dc.identifier.issn 1944-8244 -
dc.identifier.scopusid 2-s2.0-84976338341 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/20014 -
dc.identifier.url http://pubs.acs.org/doi/abs/10.1021/acsami.6b01830 -
dc.identifier.wosid 000378584800091 -
dc.language 영어 -
dc.publisher AMER CHEMICAL SOC -
dc.title Photopatterned Polydiacetylene Images Using a DNA Bio-Photomask -
dc.type Article -
dc.description.isOpenAccess FALSE -
dc.relation.journalWebOfScienceCategory Nanoscience & Nanotechnology; Materials Science, Multidisciplinary -
dc.relation.journalResearchArea Science & Technology - Other Topics; Materials Science -
dc.description.journalRegisteredClass scie -
dc.description.journalRegisteredClass scopus -
dc.subject.keywordAuthor bio-photomask -
dc.subject.keywordAuthor DNA -
dc.subject.keywordAuthor photopatterning -
dc.subject.keywordAuthor polydiacetylene (PDA) -
dc.subject.keywordAuthor PVDF membrane -
dc.subject.keywordPlus COLORIMETRIC DETECTION -
dc.subject.keywordPlus SOFT LITHOGRAPHY -
dc.subject.keywordPlus PDA LIPOSOMES -
dc.subject.keywordPlus NUCLEIC-ACIDS -
dc.subject.keywordPlus SUPRAMOLECULES -
dc.subject.keywordPlus SENSOR -
dc.subject.keywordPlus POLYMERIZATION -
dc.subject.keywordPlus NANOPARTICLES -
dc.subject.keywordPlus ABSORPTION -
dc.subject.keywordPlus DEPOSITION -

qrcode

Items in Repository are protected by copyright, with all rights reserved, unless otherwise indicated.