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Fine Line Lithography를 위한 Polymer Resist에 관한 연구

Alternative Title
Studies on Polymer Resist for Fine Line Lithography
Author(s)
Park, Lee Soon, Ha, Ki-Ryong, Son, Se-Mo
Issued Date
1993-03
URI
https://scholarworks.unist.ac.kr/handle/201301/17171
Fulltext
http://scholar.ndsl.kr/schArticleDetail.do?cn=JAKO199311920248262
Citation
한국인쇄학회지, v.11, no.1, pp.71 - 84
Abstract
Practically to put use high-photosensitive polymer, poly(vinyl cinnamoyl acetate), we investigated and confirmed UCHIDA`s synthesis, according to control solvent, which is the esterification of poly (vinyl alcohol) with monochloroacetic acid and can be freely conrolled the successive cinnamoyl acetoxyl esterfication of PVCiA, and intruducing photosensitizers,studied the photosensitivity of PVCiA.
Publisher
한국인쇄학회
ISSN
1226-1149

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