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dc.citation.endPage 243 -
dc.citation.number 3 -
dc.citation.startPage 239 -
dc.citation.title SENSORS AND ACTUATORS A-PHYSICAL -
dc.citation.volume 57 -
dc.contributor.author Park, LS -
dc.contributor.author Hur, YJ -
dc.contributor.author Sohn, BK -
dc.date.accessioned 2023-12-22T12:38:23Z -
dc.date.available 2023-12-22T12:38:23Z -
dc.date.created 2015-09-18 -
dc.date.issued 1996-12 -
dc.description.abstract An EET-type K+ -sensitive sensor with a membrane composed of a hydrophobic inner layer and a hydrophilic outer layer has been fabricated by a photolithographic process. The base chip for the sensor is a pH-ISFET with a thin Si3N4 layer. Negative photoresist (OMR-83) is used as the inner layer and poly(vinyl pyrrolidinone-co-vinyl acetate) solution in tetrahydrofuran containing valinomycin and 2,6-bis-(p-azidobenzylidene) cyclohexanone photosensitizer is used as the outer sensing membrane material. The K-ISFET sensor with double-layered membrane shows a high sensitivity (56 mV/decade) toward K+ ion, rapid response (1-2s) and low interference (less than 3mV/decade) from the competing H+ ion -
dc.identifier.bibliographicCitation SENSORS AND ACTUATORS A-PHYSICAL, v.57, no.3, pp.239 - 243 -
dc.identifier.doi 10.1016/S0924-4247(97)80120-3 -
dc.identifier.issn 0924-4247 -
dc.identifier.scopusid 2-s2.0-0030350245 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/16991 -
dc.identifier.url http://www.sciencedirect.com/science/article/pii/S0924424797801203 -
dc.identifier.wosid A1996WX48300012 -
dc.language 영어 -
dc.publisher ELSEVIER SCIENCE SA -
dc.title Effect of membrane structure on the performance of field-effect transistor potassium-sensitive sensor -
dc.type Article -
dc.description.journalRegisteredClass scopus -

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