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dc.citation.endPage 666 -
dc.citation.number 1 -
dc.citation.startPage 658 -
dc.citation.title JOURNAL OF APPLIED POLYMER SCIENCE -
dc.citation.volume 107 -
dc.contributor.author Kim, Soon Hak -
dc.contributor.author Kwon, Younghwan -
dc.contributor.author Han, Yoon Soo -
dc.contributor.author Hur, Youngjune -
dc.contributor.author Kwak, Giseop -
dc.contributor.author Woo, Chang Min -
dc.contributor.author Hur, Byung Ki -
dc.contributor.author Park, Lee Soon -
dc.date.accessioned 2023-12-22T09:06:10Z -
dc.date.available 2023-12-22T09:06:10Z -
dc.date.created 2015-09-18 -
dc.date.issued 2008-01 -
dc.description.abstract Ag electrodes with line width uniformity for large-sized plasma display panels were successfully fabricated through a photolithographic process using photosensitive Ag pastes with optimized photosensitive properties. The photosensitivity of the Ag electrode pastes in the photolithographic process was investigated as a function of the types and contents of photoinitiators, the molecular weights and acid values of acrylic binders with carboxylic acid groups, and the process variables, such as the UV-light intensity and dose, with a step tablet. This study revealed that the photoinitiator was a major parameter for the photosensitivity of the Ag electrode pastes. With the photosensitivity of the photosensitive Ag electrode pastes optimized by the study of the photoinitiator contents, Ag electrodes with line width uniformity were achieved with an HSP-188 photoinitiator content of 15 wt % on the basis of the reactive monomers, regardless of the variation of the light dose from 250 2 2 to 350 mJ/cm(2) and intensity from 15 to 25 mW/cm(2). (C) 2007 Wiley Periodicals, Inc -
dc.identifier.bibliographicCitation JOURNAL OF APPLIED POLYMER SCIENCE, v.107, no.1, pp.658 - 666 -
dc.identifier.doi 10.1002/app.27139 -
dc.identifier.issn 0021-8995 -
dc.identifier.scopusid 2-s2.0-36849072339 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/16963 -
dc.identifier.url http://onlinelibrary.wiley.com/doi/10.1002/app.27139/abstract;jsessionid=61D44CD07DBE6D987D3F91C729484641.f04t04 -
dc.identifier.wosid 000250822200084 -
dc.language 영어 -
dc.publisher WILEY-BLACKWELL -
dc.title Effect of photosensitivity in acrylic photoreactive electrode pastes on line width uniformity for large-sized plasma display panels -
dc.type Article -
dc.description.journalRegisteredClass scopus -
dc.subject.keywordAuthor lithography -
dc.subject.keywordAuthor photopolimerization -
dc.subject.keywordAuthor processing -
dc.subject.keywordAuthor radiation -
dc.subject.keywordPlus PRESSURE-SENSITIVE ADHESIVE -
dc.subject.keywordPlus PHOTOPOLYMERIZATION -
dc.subject.keywordPlus DERIVATIVES -

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