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Effect of photosensitivity in acrylic photoreactive electrode pastes on line width uniformity for large-sized plasma display panels

Author(s)
Kim, Soon HakKwon, YounghwanHan, Yoon SooHur, YoungjuneKwak, GiseopWoo, Chang MinHur, Byung KiPark, Lee Soon
Issued Date
2008-01
DOI
10.1002/app.27139
URI
https://scholarworks.unist.ac.kr/handle/201301/16963
Fulltext
http://onlinelibrary.wiley.com/doi/10.1002/app.27139/abstract;jsessionid=61D44CD07DBE6D987D3F91C729484641.f04t04
Citation
JOURNAL OF APPLIED POLYMER SCIENCE, v.107, no.1, pp.658 - 666
Abstract
Ag electrodes with line width uniformity for large-sized plasma display panels were successfully fabricated through a photolithographic process using photosensitive Ag pastes with optimized photosensitive properties. The photosensitivity of the Ag electrode pastes in the photolithographic process was investigated as a function of the types and contents of photoinitiators, the molecular weights and acid values of acrylic binders with carboxylic acid groups, and the process variables, such as the UV-light intensity and dose, with a step tablet. This study revealed that the photoinitiator was a major parameter for the photosensitivity of the Ag electrode pastes. With the photosensitivity of the photosensitive Ag electrode pastes optimized by the study of the photoinitiator contents, Ag electrodes with line width uniformity were achieved with an HSP-188 photoinitiator content of 15 wt % on the basis of the reactive monomers, regardless of the variation of the light dose from 250 2 2 to 350 mJ/cm(2) and intensity from 15 to 25 mW/cm(2). (C) 2007 Wiley Periodicals, Inc
Publisher
WILEY-BLACKWELL
ISSN
0021-8995
Keyword (Author)
lithographyphotopolimerizationprocessingradiation
Keyword
PRESSURE-SENSITIVE ADHESIVEPHOTOPOLYMERIZATIONDERIVATIVES

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