dc.citation.endPage |
548 |
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dc.citation.startPage |
539 |
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dc.citation.title |
MOLECULAR CRYSTALS AND LIQUID CRYSTALS |
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dc.citation.volume |
514 |
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dc.contributor.author |
Ryu, Seung-Min |
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dc.contributor.author |
Yang, Dong-Yol |
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dc.contributor.author |
So, Je-Yong |
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dc.contributor.author |
Park, Lee-Soon |
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dc.contributor.author |
Kim, Tae-Hoon |
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dc.date.accessioned |
2023-12-22T07:37:53Z |
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dc.date.available |
2023-12-22T07:37:53Z |
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dc.date.created |
2015-09-18 |
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dc.date.issued |
2009-11 |
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dc.description.abstract |
X-ray lithography has been used widely for the fabrication of nano/micro structures. This process was applied to the fabrication of barrier ribs with a high aspect ratio for plasma display panel (PDP). The design of X-ray mask and X-ray exposure process were optimized to fabricate highly precise barrier rib pattern for PDP |
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dc.identifier.bibliographicCitation |
MOLECULAR CRYSTALS AND LIQUID CRYSTALS, v.514, pp.539 - 548 |
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dc.identifier.doi |
10.1080/15421400903240829 |
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dc.identifier.issn |
1542-1406 |
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dc.identifier.scopusid |
2-s2.0-74549127739 |
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dc.identifier.uri |
https://scholarworks.unist.ac.kr/handle/201301/16957 |
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dc.identifier.url |
http://www.tandfonline.com/doi/abs/10.1080/15421400903240829 |
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dc.identifier.wosid |
000271867500023 |
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dc.language |
영어 |
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dc.publisher |
TAYLOR & FRANCIS LTD |
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dc.title |
Fabrication of Step-Formed PDP Barrier Ribs with High Aspect Ratio by X-Ray Lithography |
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dc.type |
Article |
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dc.description.journalRegisteredClass |
scopus |
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