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Fabrication of Step-Formed PDP Barrier Ribs with High Aspect Ratio by X-Ray Lithography

Author(s)
Ryu, Seung-MinYang, Dong-YolSo, Je-YongPark, Lee-SoonKim, Tae-Hoon
Issued Date
2009-11
DOI
10.1080/15421400903240829
URI
https://scholarworks.unist.ac.kr/handle/201301/16957
Fulltext
http://www.tandfonline.com/doi/abs/10.1080/15421400903240829
Citation
MOLECULAR CRYSTALS AND LIQUID CRYSTALS, v.514, pp.539 - 548
Abstract
X-ray lithography has been used widely for the fabrication of nano/micro structures. This process was applied to the fabrication of barrier ribs with a high aspect ratio for plasma display panel (PDP). The design of X-ray mask and X-ray exposure process were optimized to fabricate highly precise barrier rib pattern for PDP
Publisher
TAYLOR & FRANCIS LTD
ISSN
1542-1406

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