Scholarworks@UNIST

UNIST Library
Search

Browsing by Keyword : Nucleation

All A B C D E F G H I J K L M N O P Q R S T U V W X Y Z
가 나 다 라 마 바 사 아 자 차 카 타 파 하
Sort by: In order: Results/Page Etal:

Showing results 1 to 6 of 6

Atomic layer deposition of ruthenium (Ru) thin films using ethylbenzen-cyclohexadiene Ru(0) as a seed layer for copper metallization File

Yeo, Seungmin , Choi, Sang-Hyeok , Park, Ji-Yoon , Kim, Soo-Hyun , Cheon, Taehoon , Lim, Byoung-Yong , Kim, Sunjung

Article Issue Date2013-11 View4
Growth of highly conformal ruthenium-oxide thin films with enhanced nucleation by atomic layer deposition File

Park, Ji-Yoon , Yeo, Seungmin , Cheon, Taehoon , Kim, Soo-Hyun , Kim, Min-Kyu , Kim, Hyungjun , Hong, Tae Eun , Lee, Do-Joong

Article Issue Date2014-10 View4
Nucleation-controlled growth of Cu thin films electrodeposited directly on ALD Ru diffusion barrier in additive-free electrolyte for Cu interconnect File

Im, Byoungyong , Kim, Sunjung , Kim, Soo-Hyun

Article Issue Date2023-04 View10
Ruthenium and ruthenium dioxide thin films deposited by atomic layer deposition using a novel zero-valent metalorganic precursor, (ethylbenzene)(1,3-butadiene)Ru(0), and molecular oxygen File

Yeo, Seungmin , Park, Ji-Yoon , Lee, Seung-Joon , Lee, Do-Joong , Seo, Jong Hyun , Kim, Soo-Hyun

Article Issue Date2015-04 View5
Seed-mediated synthesis of ultra-long copper nanowires and their application as transparent conducting electrodes File

Kim, Hyunhong , Choi, Seong-Hyeon , Kim, Mijung , Park, Jang-Ung , Bae, Joonwon , Park, Jongnam

Article Issue Date2017-11 View4
Seedless electrodeposition of Cu thin films on ALD Ru diffusion barriers with different electrical properties File

Im, Byoungyong , Mun, Kiyeung , Kim, Sunjung , Kim, Soo-Hyun

Article Issue Date2023-03 View7
1

RSS 1.0 RSS 2.0

CONTACT US

UNIST | Library

Tel : 052-217-1404 / Email : scholarworks@unist.ac.kr

Copyright (c) 2023 by UNIST LIBRARY. All rights reserved.

ScholarWorks@UNIST was established as an OAK Project for the National Library of Korea.