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A comparative study of the atomic-layer-deposited tungsten thin films as nucleation layers for W-plug deposition File

Kim, Soo-Hyun , Kwak, Nohjung , Kim, Jinwoong , Sohn, Hyunchul

Article Issue Date2006-07 View5

Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization File

Kim, Jun Beom , Kim, Soo-Hyun , Han, Won Seok , Lee, Do-Joong

Article Issue Date2016-07 View6

Atomic layer deposition of high-quality Pt thin film as an alternative interconnect replacing Cu File

Han, Seung-Min , Nandi, Dip K. , Joo, Yong-Hwan , Shigetomi, Toshiyuki , Suzuki, Kazuharu , Nabeya, Shunichi , Harada, Ryosuke , Kim, Soo-Hyun

Article Issue Date2020-05 View3

Atomic Layer Deposition of Ru for Replacing Cu-Interconnects File

Kotsugi, Yohei , Han, Seung-Min , Kim, Youn-Hye , Cheon, Taehoon , Nandi, Dip K. , Ramesh, Rahul , Yu, Neung-Kyung , Son, Kirak , Tsugawa, Tomohiro , Ohtake, Shigeyuki , et al

Article Issue Date2021-07 View3

Atomistic kinetic Monte Carlo simulation on atomic layer deposition of TiN thin film File

Kim, Sangtae , An, Hyungmin , Oh, Sangmin , Jung, Jisu , Kim, Byungjo , Nam, Sang Ki , Han, Seungwu

Article Issue Date2022-10 View8

Cobalt-based metal oxide coated with ultrathin ALD-MoS2 as an electrode material for supercapacitors File

Pawar, Sachin A. , Patil, Dipali S. , Nandi, Dip K. , Islam, Muhammad Monirul , Sakurai, Takeaki , Kim, Soo-Hyun , Shin, Jae Cheol

Article Issue Date2022-05 View5

Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors File

Jung, Hanearl , Oh, Il-Kwon , Yeo, Seungmin , Kim, Hyungjun , Lee, Su Jeong , Kim, Yun Cheol , Myoung, Jae-Min , Kim, Soo-Hyun , Lim, Jun Hyung , Lee, Sunhee

Article Issue Date2017-05 View5

Density functional theory study on the reducing agents for atomic layer deposition of tungsten using tungsten chloride precursor File

Hidayat, Romel , Chowdhury, Tanzia , Kim, Yewon , Kim, Seongyoon , Mayangsari, Tirta Rona , Kim, Soo-Hyun , Lee, Won-Jun

Article Issue Date2021-02 View7

Effects of AlOx incorporation into atomic layer deposited Ru thin films: Applications to Cu direct plating technology File

Hong, Tae Eun , Cheon, Taehoon , Kim, Soo-Hyun , Kim, Jeong-Kyu , Park, Young-Bae , Kwon, Oh Joong , Kim, Myung Jun , Kim, Jae Jeong

Article Issue Date2013-12 View1

Group IV Transition Metal (M = Zr, Hf) Precursors for High-kappa Metal Oxide Thin Films File

Lee, Ga Yeon , Yeo, Seungmin , Han, Seong Ho , Park, Bo Keun , Eom, Taeyong , Kim, Jeong Hwan , Kim, Soo-Hyun , Kim, Hyungjun , Son, Seung Uk , Chung, Taek-Mo

Article Issue Date2021-12 View5

Highly conductive and flexible fiber for textile electronics obtained by extremely low-temperature atomic layer deposition of Pt File

Lee, Jaehong , Yoon, Jaehong , Kim, Hyun Gu , Kang, Subin , Oh, Woo-Suk , Algadi, Hassan , Al-Sayari, Saleh , Shong, Bonggeun , Kim, Soo-Hyun , Kim, Hyungjun , et al

Article Issue Date2016-11 View4

Highly Conformal Amorphous W-Si-N Thin Films by Plasma-Enhanced Atomic Layer Deposition as a Diffusion Barrier for Cu Metallization File

Hong, Tae Eun , Jung, Jae-Hun , Yeo, Seungmin , Cheon, Taehoon , Bae, So Ik , Kim, Soo-Hyun , Yeo, So Jeong , Kim, Hyo-Suk , Chung, Taek-Mo , Park, Bo Keun , et al

Article Issue Date2015-01 View5

Low temperature growth of Beryllium Oxide thin films prepared via plasma enhanced atomic layer deposition File

Jang, Yoonseo , Jung, Dohwan , Sultane, Prakash R. , Larsen, Eric S. , Bielawski, Christopher W. , Oh, Jungwoo

Article Issue Date2022-01 View9

Optical Transmittance Improvements of Al2O3/TiO2 Multilayer OLED Encapsulation Films Processed by Atomic Layer Deposition File

Shin, Se-Un , Ryu, Sang Ouk

Article Issue Date2021-04 View7

Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma File

Sari, Windu , Eom, Tae-Kwang , Kim, Soo-Hyun , Kim, Hoon

Article Issue Date2010-11 View11

Plasma-free atomic layer deposition of Ru thin films using H-2 molecules as a nonoxidizing reactant File

Lee, Seung-Joon , Kim, Soo-Hyun , Saito, Masayuki , Suzuki, Kazuharu , Nabeya, Shunichi , Lee, Jeongyeop , Kim, Sangdeok , Yeom, Seungjin , Lee, Do-Joong

Article Issue Date2016-05 View3

Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor File

Ansari, Mohd Zahid , Janicek, Petr , Park, Ye Jin , NamGung, Sook , Cho, Bo Yeon , Nandi, Dip K. , Jang, Yujin , Bae, Jong-Seong , Hong, Tae Eun , Cheon, Taehoon , et al

Article Issue Date2023-05 View6

Pulsed CVD-W Nucleation Layer Using WF6 and B2H6 for Low Resistivity W File

Kim, Choon-Hwan , Rho, Il-Cheol , Kim, Soo-Hyun , Han, Il-Keoun , Kang, Hyo-Sang , Ryu, Seung-Wook , Kim, Hyeong-Joon

Article Issue Date2009-06 View4

TaCx Thin Films Prepared by Atomic Layer Deposition as Diffusion Barriers for Cu Metallization File

Hong, Tae Eun , Kim, Tae-Ho , Jung, Jae-Hun , Kim, Soo-Hyun , Kim, Hoon

Article Issue Date2014-01 View5

Very high frequency plasma reactant for atomic layer deposition File

Oh, Il-Kwon , Yoo, Gilsang , Yoon, Chang Mo , Kim, Tae Hyung , Yeom, Geun Young , Kim, Kangsik , Lee, Zonghoon , Jung, Hanearl , Lee, Chang Wan , Kim, Hyungjun , et al

Article Issue Date2016-11 View5

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