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Issue DateTitleAuthor(s)TypeView
201611Very high frequency plasma reactant for atomic layer depositionOh, Il-Kwon; Yoo, Gilsang; Yoon, Chang Mo; Kim, Tae Hyung; Yeom, Geun Young; Kim, Kangsik; Lee, Zonghoon; Jung, Hanearl; Lee, Chang Wan; Kim, Hyungjun; Lee, Han-Bo-RamARTICLE181
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