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Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu File

Jang, Yujin , Kim, Jun Beom , Hong, Tae Eun , Yeo, So Jeong , Lee, Sunju , Jung, Eun Ae , Park, Bo Keun , Chung, Taek-Mo , Kim, Chang Gyoun , Lee, Do-Joong , et al

Article Issue Date2016-04 View9
Hydrogen Evolution Reaction by Atomic Layer-Deposited MoNx on Porous Carbon Substrates: The Effects of Porosity and Annealing on Catalyst Activity and Stability File

Ramesh, Rahul , Sawant, Sandesh Y. , Nandi, Dip K. , Kim, Tae Hyun , Kim, Deok Hyun , Han, Seung-Min , Jang, Yujin , Ha, Myoung Gyu , Cho, Moo Hwan , Yoon, Taeho , et al

Article Issue Date2020-08 View5
Low temperature atomic layer deposited molybdenum nitride-Ni-foam composite: An electrode for efficient charge storage File

Nandi, Dip K. , Sahoo, Sumanta , Kim, Tae Hyun , Cheon, Taehoon , Sinha, Soumyadeep , Rahul, Ramesh , Jang, Yujin , Bae, Jong-Seong , Heo, Jaeyeong , Shim, Jae-Jin , et al

Article Issue Date2018-08 View5
Low-temperature direct synthesis of high quality WS2 thin films by plasma-enhanced atomic layer deposition for energy related applications File

Yeo, Seungmin , Nandi, Dip K. , Rahul, R. , Kim, Tae Hyun , Shong, Bonggeun , Jang, Yujin , Bae, Jong-Seong , Han, Jeong Woo , Kim, Soo-Hyun , Kim, Hyungjun

Article Issue Date2018-11 View5
New class of Zr precursor containing boratabenzene ligand enabling highly conformal wafer-scale zirconium dioxide thin films through atomic layer deposition File

Ansari, Mohd Zahid , Janicek, Petr , Namgung, Sook , Kim, Hyangil , Nandi, Dip K. , Cheon, Taehoon , Siddiqui, Masoom Raza , Imran, Muhammad , Jang, Yujin , Bae, Jong-Seong , et al

Article Issue Date2024-03 View3
Phase-controlled growth of cobalt oxide thin films by atomic layer deposition File

Jung, Soonyoung , Nandi, Dip K. , Yeo, Seungmin , Kim, Hyungjun , Jang, Yujin , Bae, Jong-Seong , Hong, Tae Eun , Kim, Soo-Hyun

Article Issue Date2018-03 View5
Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor File

Ansari, Mohd Zahid , Janicek, Petr , Park, Ye Jin , NamGung, Sook , Cho, Bo Yeon , Nandi, Dip K. , Jang, Yujin , Bae, Jong-Seong , Hong, Tae Eun , Cheon, Taehoon , et al

Article Issue Date2023-05 View6
Self‐Formation of a Ru/ZnO Multifunctional Bilayer for the Next‐Generation Interconnect Technology via Area‐Selective Atomic Layer Deposition File

Mori, Yuki , Cheon, Taehoon , Kotsugi, Yohei , Kim, Youn‐Hye , Park, Yejin , Ansari, Mohd Zahid , Mohapatra, Debananda , Jang, Yujin , Bae, Jong‐Seong , Kwon, Woobin , et al

Article Issue Date2023-08 View15
The effects of nitrogen incorporation on the properties of atomic layer deposited Ru thin films as a direct-plateable diffusion barrier for Cu interconnect File

Mun, Ki-Yeung , Hong, Tae Eun , Cheon, Taehoon , Jang, Yujin , Lim, Byoung-Yong , Kim, Sunjung , Kim, Soo-Hyun

Article Issue Date2014-07 View4
Wafer-scale, conformal and direct growth of MoS2 thin films by atomic layer deposition File

Jang, Yujin , Yeo, Seungmin , Lee, Han-Bo-Ram , Kim, Hyungjun , Kim, Soo-Hyun

Article Issue Date2016-03 View4
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