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Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor File

Ansari, Mohd Zahid , Janicek, Petr , Park, Ye Jin , NamGung, Sook , Cho, Bo Yeon , Nandi, Dip K. , Jang, Yujin , Bae, Jong-Seong , Hong, Tae Eun , Cheon, Taehoon , et al

Article Issue Date2023-05 View5
Process Controlled Ruthenium on 2D Engineered V-MXene via Atomic Layer Deposition for Human Healthcare Monitoring File File

Mohapatra, Debananda , Shin, Yujin , Ansari, Mohd Zahid , Kim, Youn-Hye , Park, Ye Jin , Cheon, Taehoon , Kim, Haekyoung , Lee, Jung Woo , Kim, Soo-Hyun

Article Issue Date2023-04 View17
Properties of plasma-enhanced atomic layer deposited TiCx films as a diffusion barrier for Cu metallization File

Choi, Sang-Kyung , Kim, Hangil , Kim, Junbeam , Cheon, Taehoon , Seo, Jong Hyun , Kim, Soo-Hyun

Article Issue Date2015-09 View3
Rate performance enhancement of lithium-ion battery using precise thickness-controllable-carbon-coated titanium dioxide nanowire array electrode via atomic layer deposition File

Choi, Taejin , Kim, Seong Dae , Yeo, Seungmin , Cheon, Taehoon , Kim, Soo-Hyun , Ahn, Jong-Hyun , Kim, Hyungjun

Article Issue Date2020-02 View5
Self‐Formation of a Ru/ZnO Multifunctional Bilayer for the Next‐Generation Interconnect Technology via Area‐Selective Atomic Layer Deposition File

Mori, Yuki , Cheon, Taehoon , Kotsugi, Yohei , Kim, Youn‐Hye , Park, Yejin , Ansari, Mohd Zahid , Mohapatra, Debananda , Jang, Yujin , Bae, Jong‐Seong , Kwon, Woobin , et al

Article Issue Date2023-08 View14
Significant Enhancement of the Dielectric Constant through the Doping of CeO2 into HfO2 by Atomic Layer Deposition File

Kim, Woo-Hee , Kim, Min-Kyu , Oh, Il-Kwon , Maeng, Wan Joo , Cheon, Taehoon , Kim, Soo-Hyun , Noori, Atif , Thompson, David , Chu, Schubert , Kim, Hyungjun

Article Issue Date2014-04 View4
Synthesis of Si Nanowires by Using Atmospheric Pressure Chemical Vapor Deposition with SiCl4 File

Choi, Taejin , Kim, Hyungjun , Kim, Doyoung , Cheon, Taehoon , Kim, Soo-Hyun

Article Issue Date2011-08 View5
The effects of nitrogen incorporation on the properties of atomic layer deposited Ru thin films as a direct-plateable diffusion barrier for Cu interconnect File

Mun, Ki-Yeung , Hong, Tae Eun , Cheon, Taehoon , Jang, Yujin , Lim, Byoung-Yong , Kim, Sunjung , Kim, Soo-Hyun

Article Issue Date2014-07 View3
Thermal Atomic Layer Deposition (ALD) of Ru Films for Cu Direct Plating File

Choi, Sang-Hyeok , Cheon, Taehoon , Kim, Soo-Hyun , Kang, Dae-Hwan , Park, Gye-Soon , Kim, Sunjung

Article Issue Date2011-03 View3
Thickness-dependent electrochemical response of plasma enhanced atomic layer deposited WS2 anodes in Na-ion battery File

Nandi, Dip K. , Yeo, Seungmin , Ansari, Mohd Zahid , Sinha, Soumyadeep , Cheon, Taehoon , Kwon, Jiseok , Kim, Hyungjun , Heo, Jaeyeong , Song, Taeseup , Kim, Soo-Hyun

Article Issue Date2019-11 View0
Ultralow Loading (Single-Atom and Clusters) of the Pt Catalyst by Atomic Layer Deposition Using Dimethyl ((3,4-eta) N,N-dimethyl-3-butene-1-amine-N) Platinum (DDAP) on the High-Surface-Area Substrate for Hydrogen Evolution Reaction File

Ramesh, Rahul , Han, Seungmin , Nandi, Dip K. , Sawant, Sandesh Y. , Kim, Deok Hyun , Cheon, Taehoon , Cho, Moo Hwan , Harada, Ryosuke , Shigetomi, Toshiyuki , Suzuki, Kazuharu , et al

Article Issue Date2021-02 View5
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