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Plasma Enhanced Atomic Layer Deposition of Ruthenium Thin Films Using Isopropylmethylbenzene-Cyclohexadiene-Ruthenium and NH3 Plasma File

Sari, Windu , Eom, Tae-Kwang , Kim, Soo-Hyun , Kim, Hoon

Article Issue Date2010-11 View12
Plasma-free atomic layer deposition of Ru thin films using H-2 molecules as a nonoxidizing reactant File

Lee, Seung-Joon , Kim, Soo-Hyun , Saito, Masayuki , Suzuki, Kazuharu , Nabeya, Shunichi , Lee, Jeongyeop , Kim, Sangdeok , Yeom, Seungjin , Lee, Do-Joong

Article Issue Date2016-05 View5
Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor File

Ansari, Mohd Zahid , Janicek, Petr , Park, Ye Jin , NamGung, Sook , Cho, Bo Yeon , Nandi, Dip K. , Jang, Yujin , Bae, Jong-Seong , Hong, Tae Eun , Cheon, Taehoon , et al

Article Issue Date2023-05 View7
Pulsed CVD-W Nucleation Layer Using WF6 and B2H6 for Low Resistivity W File

Kim, Choon-Hwan , Rho, Il-Cheol , Kim, Soo-Hyun , Han, Il-Keoun , Kang, Hyo-Sang , Ryu, Seung-Wook , Kim, Hyeong-Joon

Article Issue Date2009-06 View6
TaCx Thin Films Prepared by Atomic Layer Deposition as Diffusion Barriers for Cu Metallization File

Hong, Tae Eun , Kim, Tae-Ho , Jung, Jae-Hun , Kim, Soo-Hyun , Kim, Hoon

Article Issue Date2014-01 View5
Very high frequency plasma reactant for atomic layer deposition File

Oh, Il-Kwon , Yoo, Gilsang , Yoon, Chang Mo , Kim, Tae Hyung , Yeom, Geun Young , Kim, Kangsik , Lee, Zonghoon , Jung, Hanearl , Lee, Chang Wan , Kim, Hyungjun , et al

Article Issue Date2016-11 View5
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